Titel: | Towards traceable bidirectional optical size measurements for optical coordinate measuring machine metrology |
Autoren: |
Köning, Rainer, Physikalisch-Technische Bundesanstalt (PTB), Fachbereich 5.2, Dimensionelle Nanometrologie, ISNI: 0000 0000 1387 893X Bodermann, Bernd, Physikalisch-Technische Bundesanstalt (PTB), Fachbereich 4.2, Bild- und Wellenoptik, ISNI: 0000 0000 4617 8219 Bergmann, Detlef, Physikalisch-Technische Bundesanstalt (PTB), Fachbereich 4.2, Bild- und Wellenoptik Buhr, Egbert, Physikalisch-Technische Bundesanstalt (PTB), Fachbereich 4.2, Bild- und Wellenoptik Häßler-Grohne, Wolfgang, Physikalisch-Technische Bundesanstalt (PTB), Fachbereich 5.2, Dimensionelle Nanometrologie Alle Autoren anzeigen (7) |
Beitragende: | HostingInstitution: Physikalisch-Technische Bundesanstalt (PTB), ISNI: 0000 0001 2186 1887 |
Seiten: | 13 |
Sprache: | en |
DOI: | 10.7795/810.20130620R |
Art der Ressource: | Text / Report |
Herausgeber: | Physikalisch-Technische Bundesanstalt (PTB) |
Daten: |
Verfügbar: 2013 Veröffentlicht: 2013-08 |
Datei: |
Datei herunterladen
(application/pdf)
4.01 MB (4203195 Bytes)
MD5 Prüfsumme: 1d9d401878b0ae9590247fe312755957 SHA256 Prüfsumme: 028a6fc64da78bb9fad4fbb816e4f7bbf211c038723b39d75ec4daaf024ab60c |
Zusammenfassung: | Bidirectional measurements are to be performed for the calibrations and the reverification of the performance of optical coordinate measurement machines (CMMs). The national metrology institutes are challenged to provide internationally recognized calibrations of suitable standards at the required uncertainty level of 100 nm. Furthermore most users are not aware of the specific difficulties of these measurements. Because the optical image formation process is based on interference and diffraction the measurements depend on all of their influence parameters. The first requisite is the use of the correct threshold value, which usually needs to be determined by a simulation of the microscopic image. A comparison of optical linewidth measurements, which are one example of bidirectional measurements, and scanning electron linewidth measurement agreed down to the nanometer level. These results validate the proposed measurement procedure and the related uncertainty calculations. The experience obtained within the accreditation process of industrial labs shows that, in order to be able to achieve the desired measurement uncertainties of about 100 nm, the imaging system needs to have a monochromatic Koehler illumination, numerical aperture lager than 0.6, a magnification greater than 50 and the ability to control the deviation of the focus position to better than 100 nm. |
Anderes: | article based on oral presentation at the conference MacroScale 2011 "Recent developments in traceable dimensional measurements", Bern-Wabern (Switzerland), 04-06, October, 2011 |
Zitierform: | KÖNING, Rainer, Bernd BODERMANN, Detlef BERGMANN, Egbert BUHR, Wolfgang HÄßLER-GROHNE, Jens FLÜGGE and Harald BOSSE. Towards traceable bidirectional optical size measurements for optical coordinate measuring machine metrology. Physikalisch-Technische Bundesanstalt (PTB), 2013. doi: 10.7795/810.20130620R |
Bemerkung: | article based on oral presentation at the conference MacroScale 2011 "Recent developments in traceable dimensional measurements", Bern-Wabern (Switzerland), 04-06, October, 2011 |