Titel: On the Influence of Metal Chucks in Wideband On-Wafer Measurements
Autoren: Phung, Gia Ngoc, Physikalisch-Technische Bundesanstalt (PTB), Fachbereich 2.2, Hochfrequenz und Felder, ORCID: 0000-0001-7157-1263
Arz, Uwe, Physikalisch-Technische Bundesanstalt (PTB), Fachbereich 2.2, Hochfrequenz und Felder, ORCID: 0000-0003-0372-2626
Beitragende: HostingInstitution: Physikalisch-Technische Bundesanstalt (PTB), ISNI: 0000 0001 2186 1887
Seiten:4
Sprache:en
DOI:10.7795/EMPIR.18SIB09.CA.20220915C
Art der Ressource: Text / Article
Herausgeber: Physikalisch-Technische Bundesanstalt (PTB)
Rechte: Private use is allowed for non-profit purposes only.
Daten: Verfügbar: 2022-09-21
Erstellt: 2022-08-01
Datei: Datei herunterladen (application/pdf) 6.55 MB (6864927 Bytes)
MD5 Prüfsumme: 50cf3216680954f1a5721b84a8a9a91d
SHA256 Prüfsumme: 7a1896663b47ec843743b35f4a535479e50fc85c2ec33505457f87ec6a7b38e2
Schlagworte calibration ; coplanar waveguides ; on-wafer ; probes
Zusammenfassung: On-wafer measurements are essential for the characterization of electronic devices at millimeter-wave frequencies. They have been known as challenging and ambitious containing a lot of parasitic effects. While a lot of investigations have been performed for on-wafer measurements of coplanar waveguides (CPW) placed on ceramic chucks, the parasitic effects related to the influence of metal chucks have not been fully investigated yet. This paper demonstrates a systematic study of the metal chuck in conjunction with the parasitic probe effects using two different probe types in mTRL-calibrated CPW measurements through a thorough field analysis.
Zitierform: G. N. Phung and U. Arz, "On the Influence of Metal Chucks in Wideband On-Wafer Measurements," in 2022 98th ARFTG Microwave Measurement Conference (ARFTG), 2022, pp. 1-4, doi: 10.1109/ARFTG52954.2022.9844119
Förderung: European Commission (EC), ISNI: 0000 0001 2162 673X, Grant Title: Traceability for electrical measurements at millimetre-wave and terahertz frequencies for communications and electronics technologies, Grant Number: EMPIR 18SIB09