| Title: | On the Influence of Metal Chucks in Wideband On-Wafer Measurements |
| Authors: |
Phung, Gia Ngoc, Physikalisch-Technische Bundesanstalt (PTB), Fachbereich 2.2, Hochfrequenz und Felder, ORCID: 0000-0001-7157-1263 Arz, Uwe, Physikalisch-Technische Bundesanstalt (PTB), Fachbereich 2.2, Hochfrequenz und Felder, ORCID: 0000-0003-0372-2626 |
| Contributors: | HostingInstitution: Physikalisch-Technische Bundesanstalt (PTB), ISNI: 0000 0001 2186 1887 |
| Pages: | 4 |
| Language: | en |
| DOI: | 10.7795/EMPIR.18SIB09.CA.20220915C |
| Resource Type: | Text / Article |
| Publisher: | Physikalisch-Technische Bundesanstalt (PTB) |
| Rights: | Private use is allowed for non-profit purposes only. |
| Dates: |
Available: 2022-09-21 Created: 2022-08-01 |
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| Keywords | calibration ; coplanar waveguides ; on-wafer ; probes |
| Abstract: | On-wafer measurements are essential for the characterization of electronic devices at millimeter-wave frequencies. They have been known as challenging and ambitious containing a lot of parasitic effects. While a lot of investigations have been performed for on-wafer measurements of coplanar waveguides (CPW) placed on ceramic chucks, the parasitic effects related to the influence of metal chucks have not been fully investigated yet. This paper demonstrates a systematic study of the metal chuck in conjunction with the parasitic probe effects using two different probe types in mTRL-calibrated CPW measurements through a thorough field analysis. |
| Citation: | G. N. Phung and U. Arz, "On the Influence of Metal Chucks in Wideband On-Wafer Measurements," in 2022 98th ARFTG Microwave Measurement Conference (ARFTG), 2022, pp. 1-4, doi: 10.1109/ARFTG52954.2022.9844119 |
| Funding: | European Commission (EC), ISNI: 0000 0001 2162 673X, Grant Title: Traceability for electrical measurements at millimetre-wave and terahertz frequencies for communications and electronics technologies, Grant Number: EMPIR 18SIB09 |