The MetAMCII project was established to develop a robust measurement infrastructure for key AMC
species such as HCl at those trace concentrations found in cleanroom fabrication environments. This
involves development of sensitive and traceable detection methods, low uncertainty static and dynamic
reference materials to validate the optical detection techniques, measurement campaigns in cleanroom environments and metrological inter-comparison. Hence, one of the aims of the MetAMCII project is to measure trace levels of key AMC species such as HCl with a target detection of less than 1 nmol/mol in less than a minute which was, so far, difficult to achieve using classical analytical techniques. The focus of the project is on HCl, which is a critical AMC in the semiconductor manufacturing environment.