Title: On the importance of calibration standards definitions for on-wafer measurements up to 110 GHz
Authors: Probst, Thorsten, Physikalisch-Technische Bundesanstalt (PTB), Fachbereich 2.2, Hochfrequenz und Felder
Zinal, Sherko, Physikalisch-Technische Bundesanstalt (PTB), Fachbereich 2.2, Hochfrequenz und Felder
Dörner, Ralf, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik - FBH, Berlin, Germany
Arz, Uwe, Physikalisch-Technische Bundesanstalt (PTB), Fachbereich 2.2, Hochfrequenz und Felder
Contributors: HostingInstitution: Physikalisch-Technische Bundesanstalt (PTB), ISNI: 0000 0001 2186 1887
Language:en
DOI:10.7795/EMPIR.14IND02.CA.20190403C
Resource Type: Text / Article
Publisher: Physikalisch-Technische Bundesanstalt (PTB)
Rights: Private use is allowed for non-profit purposes only.
Dates: Available: 2019-04-08
File: Download File (application/pdf) 404.27 kB (413969 Bytes)
MD5 Checksum: 2bc1d60079dede763002070b2e93af18
SHA256 Checksum: 458330f39d7c3755edda494faf8593a02ca6e18201ce30fdcf8335b923317ff2
Keywords: on-wafer ; calibration ; substrate ; probes
Abstract: This paper reports on the follow-up evaluation of an on-wafer measurement comparison on custom-made and conventional alumina calibration substrates in the frequency range up to 110GHz. The focus of the current investigation is on the performance of different calibration methods used for correcting device under test (DUT) measurements on the custommade substrate. Four different calibration schemes are discussed and the results of the calibration methods are presented and compared.