| Titel: | 110 GHz on-wafer measurement comparison on alumina substrate |
| Autoren: |
Probst, Thorsten, Physikalisch-Technische Bundesanstalt (PTB), Fachbereich 2.2, Hochfrequenz und Felder Dörner, Ralf, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik - FBH, Berlin, Germany Ohlrogge, Matthias, Fraunhofer-Institut für Angewandte Festkörperphysik - IAF, Freiburg i. Br., Germany Lozar, Roger, Fraunhofer-Institut für Angewandte Festkörperphysik - IAF, Freiburg i.Br., Germany Arz, Uwe, Physikalisch-Technische Bundesanstalt (PTB), Fachbereich 2.2, Hochfrequenz und Felder |
| Beitragende: | HostingInstitution: Physikalisch-Technische Bundesanstalt (PTB), ISNI: 0000 0001 2186 1887 |
| Sprache: | en |
| DOI: | 10.7795/EMPIR.14IND02.CA.20190403A |
| Art der Ressource: | Text / Article |
| Herausgeber: | Physikalisch-Technische Bundesanstalt (PTB) |
| Rechte: | Private use is allowed for non-profit purposes only. |
| Daten: |
Verfügbar: 2019-04-08 |
| Datei: |
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| Schlagworte | on-wafer ; calibration ; substrate ; probes |
| Zusammenfassung: | This paper reports on initial results of a three-party on-wafer measurement comparison carried out on a custom-made alumina calibration substrate in the frequency range up to 110 GHz. The correction of the vector network analyzer measurement is done with the highly accurate multiline TRL (mTRL) calibration. The focus of the investigation is on the influence of the measurement system, the probe geometry and operator skills. The results of the calibrations are presented and the influence on selected devices under tests (DUT) are evaluated for different measurement configurations. |