Title: Calibration of photomasks for optical coordinate metrology
Authors: Meli, Felix, Federal Office of Metrology METAS, Laboratory for Nano- and Microtechnology, Bern-Wabern, Switzerland
Contributors: HostingInstitution: Physikalisch-Technische Bundesanstalt (PTB), ISNI: 0000 0001 2186 1887
Pages:12
Language:en
DOI:10.7795/810.20130620C
Resource Type: Text / Report
Publisher: Physikalisch-Technische Bundesanstalt (PTB)
Dates: Available: 2013
Issued: 2013-08
File: Download File (application/pdf) 1.92 MB (2015463 Bytes)
MD5 Checksum: ac195fd3cbf9b8d2e8c730a5aad6056c
SHA256 Checksum: a410bc25547e9fe356a75701bff44a5ad9b94362101888c7b9285838d17fe19e
Keywords: photomask ; optical coordinate metrology ; ISO 10360-7 ; test circle ; roundness
Abstract: Optical coordinate measuring machines (CMMs) are widely used in industrial production for fast measurements on complex components. According to ISO 10360-7 the calibration and verification of
these CMMs requires certified line scales or grid plates. Additionally, for the determination of the
probing error of the imaging probe, masks with form calibrated test circles are compulsory. Using the
photomask measuring instrument developed at METAS and using new specific procedures, it is
possible to calibrate not only structure positions but also the diameter and roundness of circular
structures with competitive uncertainties.
Other: article based on oral presentation at the conference MacroScale 2011 "Recent developments in traceable dimensional measurements",
Bern-Wabern (Switzerland), 04-06, October, 2011
Citation: MELI, Felix. Calibration of photomasks for optical coordinate metrology. Physikalisch-Technische Bundesanstalt (PTB), 2013. doi: 10.7795/810.20130620C
Remark: article based on oral presentation at the conference MacroScale 2011 "Recent developments in traceable dimensional measurements", Bern-Wabern (Switzerland), 04-06, October, 2011