| Title: | Calibration of photomasks for optical coordinate metrology |
| Authors: | Meli, Felix, Federal Office of Metrology METAS, Laboratory for Nano- and Microtechnology, Bern-Wabern, Switzerland |
| Contributors: | HostingInstitution: Physikalisch-Technische Bundesanstalt (PTB), ISNI: 0000 0001 2186 1887 |
| Pages: | 12 |
| Language: | en |
| DOI: | 10.7795/810.20130620C |
| Resource Type: | Text / Report |
| Publisher: | Physikalisch-Technische Bundesanstalt (PTB) |
| Dates: |
Available: 2013 Issued: 2013-08 |
| File: |
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| Keywords: | photomask ; optical coordinate metrology ; ISO 10360-7 ; test circle ; roundness |
| Abstract: | Optical coordinate measuring machines (CMMs) are widely used in industrial production for fast measurements on complex components. According to ISO 10360-7 the calibration and verification of these CMMs requires certified line scales or grid plates. Additionally, for the determination of the probing error of the imaging probe, masks with form calibrated test circles are compulsory. Using the photomask measuring instrument developed at METAS and using new specific procedures, it is possible to calibrate not only structure positions but also the diameter and roundness of circular structures with competitive uncertainties. |
| Other: | article based on oral presentation at the conference MacroScale 2011 "Recent developments in traceable dimensional measurements", Bern-Wabern (Switzerland), 04-06, October, 2011 |
| Citation: | MELI, Felix. Calibration of photomasks for optical coordinate metrology. Physikalisch-Technische Bundesanstalt (PTB), 2013. doi: 10.7795/810.20130620C |
| Remark: | article based on oral presentation at the conference MacroScale 2011 "Recent developments in traceable dimensional measurements", Bern-Wabern (Switzerland), 04-06, October, 2011 |